TruPlasma RF Series 3000

As a result of its excellent efficiency, this generator boasts half of the power loss and a reduction in required cooling water, enabling you to minimize your operating costs. The extremely robust generator design enables longer operating times, even for critical processes, and thus higher coating rates. Plasma fluctuations are effectively prevented as a result of CombineLine technology with true 50 ohm output impedance – ensuring absolutely stable processes.

The robust design ensures the maximum reliability and productivity of your processes. 100% mismatch protection guarantees secure operation, even during critical loads. Optional continuous or pulsed power output supports a broad array of process requirements. More than 20,000 units are already installed around the world – more than any other plasma power supply.

SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.